Runs up to 50x faster
UniformityPro is a software utility that models and predicts coating uniformity for various source and planetary positions. It predicts uniformity for either single or double rotation. The software can fit source plume distributions based on chamber measurements. It can optimize chamber configuration parameters to provide maximum uniformity and efficiency. When chamber configuration geometry design is insufficient for adequate uniformity, masks may be designed by the software and optimized to improve coating uniformity. The uniformity computation includes the effects, if any, of self-shadowing on steeply curved parts. Parts may be flat or lens surfaces of specified curvatures or aspheric coefficients with various aperture shapes. Numerical optimization is used to design masks to produce uniformly thick coating layers that are specific to the chamber being modeled. It models single or double rotation, multiple planetary rotations. It can accommodate tilted planets, tilted sources, and multiple sources. It can design multiple masks of leaf-type shapes and other shapes including arbitrary shapes using tables to define the mask edge.
Now available! UniformityPro-6 is released. It is an easier to use version that also runs up to 50 times faster. New source types are introduced including: ring sources which model extended round sources, race-track sources which model rectangular extended sources, and custom types where the user assembles multiple single sources for the model. New mask shapes are introduced including: conic leaf masks and polynomial masks. Optimizers have been improved and new techniques are introduced including Simplex Optimization. Multiple parts and multiple sources may be included in the optimization. New graphics capabilities are introduced.