RF-Plasma Source Manufacturer
CCR Technology is the only supplier of the COPRA Plasma Technology® and serves the supply chain of end user, original equipment manufacturers and research groups in markets like optics, solar, semiconductor, wear & decorative coatings as well as storage and display media. The business of CCR is all around COPRA Plasma Sources based on a uniqe 13.56 MHz plasma excitation which is superior due to its power efficiency, scalability and its reliability. Target applications are plasma enhanced chemical vapor deposition "PECVD" of silicon, carbon, oxides and nitrides for absorber and passivation layers, for optical filter stacks as well as for hard protective DLC and wear& decorative coatings.
One of the biggest strengths is to adapt its plasma source design and dimensions to most of existing coater designs and deliver highly competitive plasma source solutions for dimensions up to Generation 5.
The COPRA Plasma Technology is based on its own patented 13.56 MHz plasma excitation method which enables state of the art rf power transmission and gas dissociation efficiences, unrivaled scalability paired with a robust industrial proven design from R&D to any kind of industrial production
scale. The COPRA Technology® characteristics
allows one to work with unchanging basic plasma parameters.
This means that your process result is not negatively
affected by scaling in size and speed as long as the
right power level is adjusted.
Products: COPRA Plasma Sources as Linear-, Rectangular-, Round- and built in sources to be placed fully in your vacuum chamber.
For more information please visit our website www.ccrtechnology.de or contact us directly email@example.com