Sputtering Sources, Power Supplies, Reactive Gas Controllers
Materials Science, Inc. was established in 1989 to supply SunSourceä planar magnetron sputtering sources – a new generation of the highest performance, most productive, most reliable, most easily maintained & serviced sources. Today, our products also include the Ion™ Series DC power supplies with advanced arc suppression for reactive sputtering & substrate bias, RF power generation systems & components like RF blocking filters & power supply switches.
SunSourceä GEN II sputtering sources include practical features designed to enhance reliability & productivity in industrial environments. Materials Science was the first to introduce injection of sputtering gas through the cathode body (thereby eliminating gas manifolds & various process issues) & to implement efficient water flow allowing high power levels without magnet or target overheating. We were pioneers in the development of a wide uniform target erosion area resulting in stable reactive sputtering processes, long useful target life (high target utilization), virtually no material re-deposition & higher rates & power densities. Conversely, these same sources are stable & uniquely provide high target utilization at very low power levels. The company introduced the Kamlokä fast target exchange system allowing target exchanges in minutes regardless of length - eliminating galling & seizure of fasteners that are no longer required.
Complete 2” & 3” diameter target Polaris™ DC & RF research sputtering packages that include power generation systems plus adjustable position, tilt, shutters with a unique flexible feedthrough shaft & other options are available. They are incredibly stable at very low power levels & absolutely repeatable, run to run.